Japanese scientists develop new EUV lithography technology

Professor Tsumoru Shintake of the Okinawa Institute of Science and Technology (OIST) has proposed an extreme ultraviolet (EUV) lithography technology that is supposedly superior to the method currently used in semiconductor manufacturing. The proposed method uses smaller EUV light sources, which in turn reduces costs and makes the technology more sustainable as it consumes less than one-tenth the power of conventional EUV lithography machines.

Gil Granot-Mayer, OIST EVP and leader of OIST Innovation said: “OIST is committed to creating cutting-edge science that will impact humanity. This innovation captures the OIST spirit of exploring the impossible and offering original solutions. Although we still have a long way to go in developing this technology, we are committed to doing so. We hope that this technology from Okinawa will have a transformative impact on the semiconductor industry and help solve global issues such as energy consumption and decarbonization." 

 “The global EUV lithography market is expected to grow from $8.9 billion in 2024 to $17.4 billion in 2030, with an average annual growth rate of approximately 12 percent,” Shintake said. “This patent has the potential to generate tremendous economic benefits.”