Intel revealed that it has completed the assembly of its High Numerical Aperture NA Extreme Ultraviolet (High NA EUV) lithography tool at the company’s R&D site in Hillsboro, Oregon. This tool will allow it to deliver new levels of precision and scalability in chip manufacturing, enabling ...
Intel completes assembly of High NA EUV system in Oregon
Apr 19, 2024 | Posted by Abdul-Rahman Oladimeji | Intel